商品规格
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型号 :
PL600PM-D400
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产地 :
Taiwan, ROC
l Silicon mold
n High quality and precise flat of single crystal silicon (wafer) is fabricated byadvanced lithography and plasma etch.
n As manufactured in modern FABs, the mold is completely ready for industrial usage.
l Pattern Profile
n Defined by plasma etch, the quasi vertical profile is preciselycontrolled to moderate depth.
n Convex: pillar or line
n Concave: hole or trench
l Silicon Mold Wafer specification
n <100> P-Type (8.5Ω~11.5Ω)
n Diameter: 200 mm
n Thickness: 725 um
n Pattern edge exclusion: 3 mm
l Lithography Process
n Shot field size = 21000 x 21000 um2
n No. of Shot > 60 to cover all wafer area
n Nearly seamless exposure
n Alignment Accuracy = 200nm
l 8-inch Silicon Mold
n Please refer the [Silicon Mold - General Information]
l Mold Pattern
n Hexagonal Pillar Array, Pitch = 600 nm
n Design Pattern
▬ Width(pillar) = 300 nm, Space = 300 nm
n Depth = 400 nm
l Process Type: Premium
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